المؤلفون: Domínguez-Juárez, Jorge Luis, Macovez, Roberto, González Sagardoy, María Ujué, Martorell, Jordi

مصطلحات موضوعية: Diffraction gratings, Electron beam lithography, Nanophotonics, Nonlinear optical susceptibility, Optical fabrication, Optical harmonic generation, Optical materials, Optical modulation, organic compounds, Scanning electron microscopy

العلاقة: http://dx.doi.org/10.1063/1.3464161Test; Applied Physics Letters, 97 (2010); http://hdl.handle.net/10261/33772Test

الإتاحة: https://doi.org/10.1063/1.3464161Test
http://hdl.handle.net/10261/33772Test

المؤلفون: María Ujué González, Jorge Luis Domínguez-Juárez, Jordi Martorell, Roberto Macovez

المساهمون: Universitat Politècnica de Catalunya. Departament de Física i Enginyeria Nuclear, Universitat Politècnica de Catalunya. DONLL - Dinàmica no Lineal, Òptica no Lineal i Làsers, Universitat Politècnica de Catalunya. GCM - Grup de Caracterització de Materials

المصدر: Recercat. Dipósit de la Recerca de Catalunya
instname
Digital.CSIC. Repositorio Institucional del CSIC
UPCommons. Portal del coneixement obert de la UPC
Universitat Politècnica de Catalunya (UPC)

مصطلحات موضوعية: Diffraction, Materials science, Lithography, Physics and Astronomy (miscellaneous), Scanning electron microscope, Diffraction efficiency, Molecular physics, Optics, Molecular film, Electron beam processing, Física::Electromagnetisme [Àrees temàtiques de la UPC], Diffraction grating, Optical modulation, Nonlinear optical susceptibility, business.industry, Resolution (electron density), Electrons -- Difracció, Optical harmonic generation, Optical fabrication, Optical materials, Diffraction gratings, Nanophotonics, Electron beam lithography, business, organic compounds, Scanning electron microscopy, Electron-beam lithography

وصف الملف: application/pdf

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c0b182bfaa2d687e0297d344f2fd7bacTest
http://hdl.handle.net/10261/33772Test