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المؤلفون: Sang-Hyun Kim, Dongwan Kim, Myoung-Soo Hwang, Hyun-Woo Kim, Soon-Nam Kang, Insung Kim, Jeong-ho Yeo, Seong-Sue Kim, Cheolhong Park, Chang-min Park
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Grating, Laser, medicine.disease_cause, law.invention, Optics, Resist, law, Etching (microfabrication), medicine, Optoelectronics, Wafer, business, Ultraviolet, Spectral purity
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::ed861a6fb8242581d1f5dc221220d2bdTest
https://doi.org/10.1117/12.2046132Test -
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المؤلفون: Hyun-Woo Kim, Cheolhong Park, Hai-Sub Na, Chang-min Park, Sumin Kim, Cha-Won Koh, Kyoungyong Cho
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Pattern size, Materials science, Optics, Resist, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, Nuclear engineering, Process (computing), business, Critical dimension, Line width, Process conditions
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::ef321d9578588904a0dff27ff2fce104Test
https://doi.org/10.1117/12.879334Test -
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المؤلفون: Han-Ku Cho, Hiroshi Marumoto, Hitoshi Kosugi, Carlos Fonseca, Hai-Sub Na, Cheolhong Park, Cha-Won Koh, Kyoungyong Cho, Hyun-Woo Kim, Fumiko Iwao, Chang-min Park
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Fabrication, Resist, Coating, Etching (microfabrication), Extreme ultraviolet lithography, Extreme ultraviolet, engineering, Nanotechnology, Substrate (printing), engineering.material, Thin film, Engineering physics
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::145c947ae7d2d5a034f8559c69ea1ec5Test
https://doi.org/10.1117/12.878730Test -
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المؤلفون: Han-Ku Cho, Cha-Won Koh, Hai-Sub Na, Hyun-Woo Kim, Insung Kim, Sumin Kim, Cheolhong Park, Chang-min Park
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, Materials science, Resist, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, Reticle, Optoelectronics, Process window, Radiation, business, Lithography, Critical dimension
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c929be5210e6a9885c3309ce554a84eaTest
https://doi.org/10.1117/12.879791Test -
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المؤلفون: In S. Kim, Sungnam Choi, Joonyong Park, Kyoungyong Cho, Young Moo Lee, Y. J. Lee, Chan-Hoon Park, Sungwoo Hwang, Dong-Ryul Lee, Kyuhong Kim, Byoung-chan Lee, Jeong-ho Yeo, Cheolhong Park
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, law, Multiple patterning, X-ray lithography, Nanotechnology, Photolithography, Ion beam lithography, Lithography, Next-generation lithography, Electron-beam lithography, law.invention, Nanoimprint lithography
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::bdb70550d264a3e780a71b55f95d3d2aTest
https://doi.org/10.1117/12.846481Test