Three dimensional (3-D) FinFET devices with an ultra-high Si-fin aspect ratio (Height/Width = 82.9 nm/8.6 nm) have been developed after integrating a 14 A nitrided gate oxide upon the silicon on insulator (SOI) wafers through an advanced CMOS logic platform. The drive current (ION), off current (IOFF), subthreshold swing (SS), drain-induced barrier lowering (DIBL) and transistor gate delay of 30 nm gate length (Lg) of FinFETs illustrate the promising device performance. The TCAD simulations demonstrate that both threshold voltage (Vth) and off current can be adjusted appropriately through the full silicidation (FUSI) of CoSi2 gate engineering. Moreover, the drive currents of n- and p-channel FinFETs are able to be further enhanced once applying the raised Source/Drain (S/D) approach technology for reducing the S/D resistance drastically.
