المؤلفون: Pekka J. Soininen, Wei-Min Li, Juhana Kostamo, H. Sprey, Kai Elers, Marko Tuominen, N. Raaijmakers, Suvi Haukka

المصدر: Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519).

مصطلحات موضوعية: Materials science, Compatibility (geochemistry), chemistry.chemical_element, Nanotechnology, Chemical vapor deposition, Copper, Metal, Barrier layer, Atomic layer deposition, Chemical engineering, chemistry, visual_art, visual_art.visual_art_medium, Deposition (phase transition), Layer (electronics)

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::80a754b64ffd1e510c692b9e1fe02a49Test
https://doi.org/10.1109/iitc.2002.1014956Test

المؤلفون: Marko Tuominen, S. Smith, Suvi Haukka, M. Soininen, Wei-Min Li, Kai Elers, W Besling, Sari Johanna Kaipio, Hannu Huotari, Juhana Kostamo, Pekka J. Soininen

المصدر: Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519).

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Diffusion barrier, chemistry, Impurity, Analytical chemistry, Electronic engineering, Chemical vapor deposition, Thin film, Layer (electronics), Deposition (law), Tungsten nitride, Carbide

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::93a42bd4dcdef2bf18bbd3b956937f93Test
https://doi.org/10.1109/iitc.2002.1014930Test

المؤلفون: Haukka, S., Raaijmakers, N., Elers, K.-E., Kostamo, J., Wei-Min Li, Sprey, H., Soininen, P.J., Tuominen, M.

المصدر: Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519); 2002, p279-281, 3p

المؤلفون: Wei-Min Li, Kai Elers, Juhana Kostamo, Kaipio, S., Huotari, H., Soininen, M., Soininen, P.J., Tuominen, M., Haukka, S., Smith, S., Besling, W.

المصدر: Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519); 2002, p191-193, 3p