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1
المؤلفون: J. W. Lee, William Scott Hobson, S. J. Pearton, Randy J. Shul, C. R. Abernathy, C. Constantine
المصدر: Plasma Sources Science and Technology. 6:499-507
مصطلحات موضوعية: Chemistry, business.industry, Analytical chemistry, Plasma, Condensed Matter Physics, Cathode, law.invention, Ion, Chamber pressure, Semiconductor, law, Sputtering, Etching (microfabrication), Inductively coupled plasma, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::41dd05cdb953204d4c155e32392b2e73Test
https://doi.org/10.1088/0963-0252/6/4/007Test -
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المؤلفون: C. R. Abernathy, T. R. Fullowan, Fan Ren, James Robert Lothian, Rose Fasano Kopf, Avishay Katz, Stephen J. Pearton
المصدر: Plasma Sources Science and Technology. 1:18-27
مصطلحات موضوعية: Etching (microfabrication), Chemistry, Biasing, Semiconductor device, Plasma, Dry etching, Reactive-ion etching, Atomic physics, Condensed Matter Physics, Electron cyclotron resonance, Ion
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::0a1e0f10f3c74e597ab81c863ff6ee7eTest
https://doi.org/10.1088/0963-0252/1/1/004Test