Mg-doped AlGaN grown on an AlN/sapphire template by metalorganic chemical vapour deposition

التفاصيل البيبلوغرافية
العنوان: Mg-doped AlGaN grown on an AlN/sapphire template by metalorganic chemical vapour deposition
المؤلفون: Yu, Hongbo, Strupinski, Wlodek, Butun, Serkan, Ozbay, Ekmel
المصدر: Physica Status Solidi (A) - Applications and Materials Science; April 2006, Vol. 203 Issue: 5 p868-873, 6p
مستخلص: The growth of high-performance Mg-doped p-type AlxGa1–xN (x = 0.35) layers using low-pressure metalorganic chemical vapour deposition on an AlN/sapphire template is reported. The influence of growth conditions on the p-type conductivity of the AlxGa1–xN (x = 0.35) alloy was investigated. It was found that the p-type resistivity of the AlGaN alloy demonstrates a marked dependence on the Mg concentration, V/III ratio and group III element flow rate. A minimum p-type resistivity of 3.5 Ω cm for AlxGa1–xN (x = 0.35) epilayers was achieved. A Ni/Au (10 nm/100 nm) ohmic contact was also fabricated and a specific contact resistivity of 8.1 × 10–2 Ω cm2 was measured. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
قاعدة البيانات: Supplemental Index
الوصف
تدمد:18626300
18626319
DOI:10.1002/pssa.200521461