Fabrication of high quality ferrimagnetic insulators is an essential step for ultrafast magnonics, which utilizes antiferromagnetic exchange of the ferrimagnetic materials. In this work, we deposit high-quality GdIG thin films on a (111)-oriented GGG substrate using the Metal Organic Decomposition (MOD) method, a simple and high throughput method for depositing thin film materials. We postannealed samples at various temperatures and examined the effect on structural properties such as crystallinity and surface morphology. We found a transition in the growth mode that radically changes the morphology of the film as a function of annealing temperature and obtained an optimal annealing temperature for a uniform thin film with high crystallinity. Optimized GdIG has a high potential for spin wave applications with a low damping parameter in the order of 10−3, which persists down to cryogenic temperatures.
