Feature‐Size Dependence of Etch Rate in Reactive Ion Etching
| العنوان: | Feature‐Size Dependence of Etch Rate in Reactive Ion Etching |
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| المؤلفون: | Zhen H. Zhou, Young H. Lee |
| المصدر: | Journal of The Electrochemical Society. 138:2439-2445 |
| بيانات النشر: | The Electrochemical Society, 1991. |
| سنة النشر: | 1991 |
| مصطلحات موضوعية: | Silicon, Renewable Energy, Sustainability and the Environment, business.industry, Semiconductor materials, chemistry.chemical_element, Mineralogy, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Feature (computer vision), Materials Chemistry, Electrochemistry, Optoelectronics, Dry etching, Reactive-ion etching, business, Size dependence |
| تدمد: | 1945-7111 0013-4651 |
| الوصول الحر: | https://explore.openaire.eu/search/publication?articleId=doi_________::e7d966de7114c6deaf8b65cc78989532Test https://doi.org/10.1149/1.2085991Test |
| حقوق: | CLOSED |
| رقم الانضمام: | edsair.doi...........e7d966de7114c6deaf8b65cc78989532 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 19457111 00134651 |
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