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1دورية أكاديمية
المؤلفون: Andersen, Molly P.1,2 (AUTHOR), Rodenbach, Linsey K.2,3 (AUTHOR), Rosen, Ilan T.2,4 (AUTHOR), Lin, Stanley C.5 (AUTHOR), Pan, Lei6 (AUTHOR), Zhang, Peng6 (AUTHOR), Tai, Lixuan6 (AUTHOR), Wang, Kang L.6 (AUTHOR), Kastner, Marc A.2,3,7 (AUTHOR), Goldhaber-Gordon, David2,3 (AUTHOR) goldhaber-gordon@stanford.edu
المصدر: Journal of Applied Physics. 6/28/2023, Vol. 133 Issue 24, p1-10. 10p.
مصطلحات موضوعية: *ELECTRON beam lithography, *TOPOLOGICAL insulators, *THIN films, *CONDENSED matter physics, *ELECTRON beams, *NANOSTRUCTURES, *MAJORANA fermions
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2دورية أكاديمية
المؤلفون: Goswami, Aranya1 (AUTHOR), Markman, Brian1 (AUTHOR), Brunelli, Simone T. Šuran1 (AUTHOR), Chatterjee, Shouvik1 (AUTHOR), Klamkin, Jonathan1 (AUTHOR), Rodwell, Mark1 (AUTHOR), Palmstrøm, Chris J.1,2 (AUTHOR) cjpalm@ucsb.edu
المصدر: Journal of Applied Physics. 8/28/2021, Vol. 130 Issue 8, p1-9. 9p.
مصطلحات موضوعية: *ELECTRON beam lithography, *TRANSPORT theory, *CARRIER density, *DIELECTRIC materials
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3دورية أكاديمية
المؤلفون: Higashi, R.1 (AUTHOR), Ogawa, M.1 (AUTHOR), Tatebayashi, J.1 (AUTHOR) tatebaya@mat.eng.osaka-u.ac.jp, Fujioka, N.1 (AUTHOR), Timmerman, D.1 (AUTHOR), Ichikawa, S.1 (AUTHOR), Fujiwara, Y.1 (AUTHOR)
المصدر: Journal of Applied Physics. 6/21/2020, Vol. 127 Issue 23, p1-6. 6p. 1 Diagram, 5 Graphs.
مصطلحات موضوعية: *RESONATORS, *ELECTRON beam lithography, *FINITE difference time domain method, *QUALITY factor, *AUDITING standards, *ELECTRON beams
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4دورية أكاديمية
المؤلفون: Qerimi, Dren, Herschberg, Andrew C., Panici, Gianluca, Hays, Parker, Pohlman, Tyler, Ruzic, David N.
المصدر: Journal of Applied Physics; 9/21/2022, Vol. 132 Issue 11, p1-15, 15p
مصطلحات موضوعية: SURFACE wave antennas, EXTREME ultraviolet lithography, TIN, RADICAL ions, ELECTRON temperature measurement, SYSTEM downtime, ELECTRON beam lithography
الشركة/الكيان: UNIVERSITY of Illinois at Urbana-Champaign
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5دورية أكاديمية
المؤلفون: Rodríguez-Aranda, F. J.1, Méndez-Lozoya, J.1, González, F. J.1, Rodríguez, A. G.1 angel.rodriguez@uaslp.mx
المصدر: Journal of Applied Physics. 2017, Vol. 122 Issue 12, p125703-1-125703-5. 5p. 2 Color Photographs, 2 Graphs.
مصطلحات موضوعية: *NICKEL, *ELECTRON beam lithography, *RAMAN spectra, *TENSILE strength, *PHONONS
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6دورية أكاديمية
المؤلفون: Hu, Changlong, Zhou, Xiaoyu, Chen, Yuliang, Li, Liang, Li, Bowen, Ren, Hui, Zhao, Shanguang, Zou, Chongwen
المصدر: Journal of Applied Physics; 6/21/2021, Vol. 129 Issue 23, p1-7, 7p
مصطلحات موضوعية: NANOWIRES, HYDROGENATION, METAL-insulator transitions, ELECTRON beam lithography, TUNGSTEN trioxide, ELECTRONIC structure, MAGNITUDE (Mathematics), ANNEALING of metals
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7دورية أكاديمية
المؤلفون: Sudheer1,2 sudheer.rrcat@gmail.com, Porwal, S.3, Bhartiya, S.1,4, Rao, B. T.1,5, Tiwari, P.1,2, Srivastava, Himanshu1,2, Sharma, T. K.1,3, Rai, V. N.1,2, Srivastava, A. K.1,2, Naik, P. A.1,2
المصدر: Journal of Applied Physics. 7/28/2016, Vol. 120 Issue 4, p1-8. 8p. 1 Color Photograph, 3 Diagrams, 2 Charts, 5 Graphs.
مصطلحات موضوعية: *ELECTRON beam lithography, *DIFFRACTION gratings, *PLASMONICS, *SILVER nanoparticles spectra, *NANOFABRICATION, *CRYSTAL morphology, *SILVER halides, *METAL coating, *SILVER
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8دورية أكاديمية
المؤلفون: Sangwoo Kang1 swk1230@utexas.edu, Movva, Hema C. P.1, Sanne, Atresh1, Rai, Amritesh1, Banerjee, Sanjay K.1
المصدر: Journal of Applied Physics. 3/28/2016, Vol. 119 Issue 12, p124502-1-124502-7. 7p. 2 Diagrams, 6 Graphs.
مصطلحات موضوعية: *ELECTRON beam lithography, *INDUSTRIAL applications of electron beams, *MICROELECTRONICS, *ELECTRIC properties of graphene, *ELECTRIC properties of materials
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9دورية أكاديمية
المؤلفون: Thakkar, Pooja, Guzenko, Vitaliy A., Lu, Peng-Han, Dunin-Borkowski, Rafal E., Abrahams, Jan Pieter, Tsujino, Soichiro
المصدر: Journal of Applied Physics; 10/7/2020, Vol. 128 Issue 13, p1-13, 13p
مصطلحات موضوعية: PHASE shifters, ELECTRON beams, PHASE shift (Nuclear physics), ELECTRON beam lithography, METAL-insulator-metal structures, FOCUSED ion beams
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10دورية أكاديمية
المؤلفون: Adiga, V. P.1, Ilic, B.2, Barton, R. A.1, Wilson-Rae, I.3,4, Craighead, H. G.1, Parpia, J. M.5
المصدر: Journal of Applied Physics. Sep2012, Vol. 112 Issue 6, p064323. 6p.
مصطلحات موضوعية: *SILICON nitride, *ELECTRON beam lithography, *RESONATORS, *ENERGY dissipation, *INTERFEROMETRY