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1
المؤلفون: Jung H. Lee, Bakhtier Farouk, Young H. Lee
المصدر: Journal of Applied Physics. 79:7676-7681
مصطلحات موضوعية: Materials science, Hydrogen, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Dielectric, Plasma, Condensed Matter::Materials Science, symbols.namesake, chemistry, Ellipsometry, Condensed Matter::Superconductivity, Attenuation coefficient, symbols, Thin film, Raman spectroscopy, Refractive index
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::5e07a8a90076f3ea3b1b1f6bc469c24bTest
https://doi.org/10.1063/1.362432Test -
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المؤلفون: Young H. Lee, Mao‐Min Chen
المصدر: Journal of Applied Physics. 54:5966-5973
مصطلحات موضوعية: education.field_of_study, Plasma etching, Silicon, Chemistry, fungi, Population, technology, industry, and agriculture, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, macromolecular substances, Isotropic etching, stomatognathic system, Etching (microfabrication), Sputtering, Dry etching, Reactive-ion etching, education
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::2cd144600ab207b759ba63a8e12d48dfTest
https://doi.org/10.1063/1.331774Test