The effect of fluorine plasma treatment on an aluminum and neodymium alloy (Al–Nd) layer has been studied. The fluorine plasma replaces Al–O bonds with Al–F bonds on the surface of Al–Nd. The layer of Al–F bonds is preserved even if an indium tin oxide (ITO) layer is deposited on it. This layer prohibits the interfacial reaction from producing an AlOx layer between ITO and Al–Nd. The contact resistivity between ITO and Al–Nd is reduced to about 100 µΩcm2 by this fluorine plasma treatment.
