Anisotropic Distribution of Atomic Pairs Induced by the Preferential Resputtering Effect in Amorphous Gd-Fe and Gd-Co Films
| العنوان: | Anisotropic Distribution of Atomic Pairs Induced by the Preferential Resputtering Effect in Amorphous Gd-Fe and Gd-Co Films |
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| المؤلفون: | Tachiro Tsushima, Shinji Ogawa, Yuji Yamaguchi, Yoshikazu Nishihara, Toshikazu Katayama |
| المصدر: | Japanese Journal of Applied Physics. 17:1083-1088 |
| بيانات النشر: | IOP Publishing, 1978. |
| سنة النشر: | 1978 |
| مصطلحات موضوعية: | Materials science, Physics and Astronomy (miscellaneous), Condensed matter physics, Mössbauer effect, Scattering, Gadolinium, General Engineering, General Physics and Astronomy, chemistry.chemical_element, Amorphous solid, Crystallography, chemistry, Transition metal, Sputtering, X-ray crystallography, Anisotropy |
| الوصف: | Mossbauer effect and X-ray diffraction of amorphous Gd-Fe films show that isolated Gd atoms are preferentially resputtered and a non-uniform distribution of Gd atoms is induced in amorphous Gd-T (T=3d transition metal) films prepared by a sputtering method with negative bias. The resputtering effect of isolated Gd atoms produces anisotropic distributions of T-T, Gd-T and Gd-Gd pairs in Gd-T films. The difference between the numbers of T-T pairs parallel and normal to the film amounts to 1020~1021 pairs/cm3. This number of T-T pairs is appropriate to account for the oserved anisotropy of amorphus Gd-Co films. It is coucluded that the anisotropic distribution of atomic pairs is the most important origin of the magnetic uniaxial anisotropy induced by bias sputtering. |
| تدمد: | 1347-4065 0021-4922 |
| الوصول الحر: | https://explore.openaire.eu/search/publication?articleId=doi_________::b79e1e42105090aa2bd63f45b6ab85caTest https://doi.org/10.1143/jjap.17.1083Test |
| رقم الانضمام: | edsair.doi...........b79e1e42105090aa2bd63f45b6ab85ca |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 13474065 00214922 |
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