التفاصيل البيبلوغرافية
| العنوان: |
GROWTH AND STRUCTURAL STUDY OF NANOCRYSTALLINE TITANIUM OXIDE AND ZIRCONIUM OXIDE THIN FILMS DEPOSITED AT LOW TEMPERATURES. |
| المؤلفون: |
TAY, B. K.1 ebktay@ntu.edu.sg, ZHAO, Z. W.1, LAU, S. P.1, GAO, J. X.2 |
| المصدر: |
International Journal of Nanoscience. Aug2005, Vol. 4 Issue 4, p795-801. 7p. 5 Graphs. |
| مصطلحات موضوعية: |
*THIN films, *TITANIUM dioxide, *ZIRCONIUM oxide, *LOW temperatures, *POLYCRYSTALS, *CRYSTALLIZATION |
| مستخلص: |
Titanium oxide and zirconium oxide thin films were deposited at low temperatures (not exceeding 350°C) by off-plane filtered cathodic vacuum arc (FCVA). The film structures were studied by XRD and Raman spectra. For titanium oxide thin films, amorphous structure remains up to 230°C, and anatase film with the crystallite size of 16 nm is observed at 330°C as confirmed by XRD and Raman analysis. For zirconium oxide, the film structure develops from amorphous at room temperature to polycrystalline state at 150°C and above. Moreover, for the crystallized films, preferred orientation is along [-111] direction. At 150°C the films possess nano-sized crystallites (less than 15 nm). For these two kinds of metal oxide thin films, surface roughness both increases with the growth temperature. [ABSTRACT FROM AUTHOR] |
| قاعدة البيانات: |
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