Optimization of DIO3 with Megasonic Cleaning of Ru Capped EUVL Mask for Effective Carbon Contaminant Removal
| العنوان: | Optimization of DIO3 with Megasonic Cleaning of Ru Capped EUVL Mask for Effective Carbon Contaminant Removal |
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| المؤلفون: | Jung-Soo Lim, Min-Su Kim, Seung-Ho Lee, Bong-Kyun Kang, Jin-Goo Park, Ji-Hyun Jeong |
| المصدر: | ECS Transactions. 41:131-138 |
| بيانات النشر: | The Electrochemical Society, 2011. |
| سنة النشر: | 2011 |
| مصطلحات موضوعية: | Materials science, chemistry, Extreme ultraviolet lithography, Megasonic cleaning, chemistry.chemical_element, Nanotechnology, Carbon |
| الوصف: | A possible candidate for carbon contaminant removal in Ru capped EUVL mask is ozone dissolved water (DIO3). However, the use of DIO3 leaves reflectivity loss and serious surface damages on Ru capping layer caused by its high oxidation potential. In this study, an optimum DIO3 cleaning condition for effective carbon cleaning without surface damage was investigated both theoretically and experimentally. The effect of additive gases such as O2, CO2 and N2 of various concentrations were tried during DIO3 generation for oxidation stability on Ru capping layer and N2 added 15 ppm DIO3 was found to be the best condition. However carbon contaminant was ineffectively removed at this condition. Thus megasonic is irradiated during DIO3 process and the results show that carbon is not only completely removed in a shorter time but also lower reflectivity loss was accomplished with minimal increase in the surface roughness. |
| تدمد: | 1938-6737 1938-5862 |
| الوصول الحر: | https://explore.openaire.eu/search/publication?articleId=doi_________::c36064b628cf6f0be09eb32e59af6e50Test https://doi.org/10.1149/1.3630836Test |
| حقوق: | CLOSED |
| رقم الانضمام: | edsair.doi...........c36064b628cf6f0be09eb32e59af6e50 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 19386737 19385862 |
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