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المؤلفون: Yuan-Tao Zhang, Ji-Bin Fan, Peng-Fei Xie, Hong-Xia Liu, Xiao-Fu Ding, Qing-Liang Liao
المصدر: Chinese Physics B. 25:027702
مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, Annealing (metallurgy), business.industry, Transistor, Oxide, General Physics and Astronomy, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, Semiconductor device, 021001 nanoscience & nanotechnology, 01 natural sciences, Electron spectroscopy, law.invention, chemistry.chemical_compound, chemistry, X-ray photoelectron spectroscopy, law, 0103 physical sciences, Optoelectronics, Thin film, 0210 nano-technology, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::acfe6bbc1f259e525336b6ff8b980d42Test
https://doi.org/10.1088/1674-1056/25/2/027702Test -
2دورية أكاديمية
المؤلفون: Xiao-Fu Ding1, Peng-Fei Xie1, Yuan-Tao Zhang1, Qing-Liang Liao1, Ji-Bin Fan1,2,3, Hong-Xia Liu2
المصدر: Chinese Physics B. Feb2016, Vol. 25 Issue 2, p1-1. 1p.
مصطلحات موضوعية: *GERMANIUM oxide films, *COMPLEMENTARY metal oxide semiconductors, *ANNEALING of semiconductors, *STRESS relaxation (Mechanics), *HAFNIUM oxide films