التفاصيل البيبلوغرافية
| العنوان: |
Surface characterization determined from the secondary electron emission coefficient upon ion bombardment. |
| المؤلفون: |
Hechenberger, Faro1 (AUTHOR) faro.hechenberger@uibk.ac.at, Duensing, Felix1 (AUTHOR), Ballauf, Lorenz1 (AUTHOR), Raggl, Stefan1 (AUTHOR), Auer, Benedikt1 (AUTHOR), Drost, Manuel1 (AUTHOR), Thiel, Hannah2 (AUTHOR), Fridrich, Daniel2 (AUTHOR), Menzel, Alexander3 (AUTHOR), Scheier, Paul1 (AUTHOR) |
| المصدر: |
Applied Surface Science. Feb2021, Vol. 538, pN.PAG-N.PAG. 1p. |
| مصطلحات موضوعية: |
*ION bombardment, *SECONDARY electron emission, *SURFACE analysis, *ELECTRON emission, *X-ray photoelectron spectroscopy, *DC sputtering |
| مستخلص: |
• Electron emission upon Ar+ surface impact was studied with sub-mm spatial resolution. • The current density and energy of Ar+ is comparable to DC magnetron sputtering. • The influence of the grain orientation and surface contaminations was studied. • Crystal orientation has no influence on the ion induced electron emission yield. The ion induced electron emission yield upon Ar+ ion impact at 420 eV was measured for a stainless-steel sample that was partially covered with a 50 nm thick gold layer. The ion induced electron emission yield for the two target materials differs strongly and enables to reproduce the shape of the gold film with a spatial resolution that corresponds to the width of the ion beam, which is 240 µm in the present case. Details in the two-dimensional map of the ion induced electron emission yield are explained by comparison with optical and scanning electron microscopy as well as with X-ray photoelectron spectroscopy measurements of the sample surface. In contrast to the sputtering efficiency, the ion induced electron emission yield does not depend on the orientation of the crystal structure. [ABSTRACT FROM AUTHOR] |
| قاعدة البيانات: |
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