-
1
المؤلفون: Hwee Leng Seng, M. K. Kumar, Han Gao, Sing Yang Chiam, C. C. Tan, Sandipan Mallik, Chandreswar Mahata, C. K. Chia, Enrique Miranda, Hui Ru Tan, C. K. Maiti, Goutam Kumar Dalapati, Dongzhi Chi, Tanmoy Das
المصدر: Applied Physics Letters. 100:062905
مصطلحات موضوعية: Atomic layer deposition, Valence (chemistry), Materials science, Physics and Astronomy (miscellaneous), X-ray photoelectron spectroscopy, Annealing (metallurgy), Alloy, engineering, Analytical chemistry, Heterojunction, Field-effect transistor, Dielectric, engineering.material
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::6fc39bbd6972201f5f6d2fde1bec4627Test
https://doi.org/10.1063/1.3684803Test -
2
المؤلفون: Tanmoy Das, C. K. Maiti, Enrique Miranda, G. Sutradhar, Pradip K. Bose, Chandreswar Mahata
المصدر: Applied Physics Letters. 98:022901
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, Band gap, Diffusion, Inorganic chemistry, Titanium alloy, Dielectric, Sputter deposition, Sputtering, Optoelectronics, Thin film, business, Deposition (law)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8cfbe968ae5dd3b63be41362f190965bTest
https://doi.org/10.1063/1.3536520Test