التفاصيل البيبلوغرافية
| العنوان: |
Graphene nanoribbon superlattices fabricated via He ion lithography. |
| المؤلفون: |
Archanjo, Braulio S., Fragneaud, Benjamin, Cançado, Luiz Gustavo, Winston, Donald, Miao, Feng, Alberto Achete, Carlos, Medeiros-Ribeiro, Gilberto |
| المصدر: |
Applied Physics Letters; 5/12/2014, Vol. 104 Issue 19, p1-4, 4p, 1 Diagram, 1 Chart, 2 Graphs |
| مصطلحات موضوعية: |
HELIUM ions, LITHOGRAPHY, GRAPHENE, NANORIBBONS, CRYSTALLOGRAPHY, POINT defects |
| مستخلص: |
Single-step nano-lithography was performed on graphene sheets using a helium ion microscope. Parallel "defect" lines of ~1 lm length and ≈5 nm width were written to form nanoribbon gratings down to 20 nm pitch. Polarized Raman spectroscopy shows that crystallographic orientation of the nanoribbons was partially maintained at their lateral edges, indicating a high-fidelity lithography process. Furthermore, Raman analysis of large exposure areas with different ion doses reveals that He ions produce point defects with radii ~2× smaller than do Ga ions, demonstrating that scanning- Heþ-beam lithography can texture graphene with less damage. [ABSTRACT FROM AUTHOR] |
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| قاعدة البيانات: |
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