Investigation of the evolution of nitrogen defects in flash-lamp-annealed InGaZnO films and their effects on transistor characteristics

التفاصيل البيبلوغرافية
العنوان: Investigation of the evolution of nitrogen defects in flash-lamp-annealed InGaZnO films and their effects on transistor characteristics
المؤلفون: Tae-yil Eom, Chan-Mo Kang, Chee-Hong Ahn, Chiwon Kang, Yong-Hoon Kim, Hoo-Jeong Lee, Sunyoung Lee, Jun-gu Kang, Muhammad Saad Salman
المصدر: Applied Physics Express. 11:061104
بيانات النشر: IOP Publishing, 2018.
سنة النشر: 2018
مصطلحات موضوعية: 010302 applied physics, Flash-lamp, Materials science, business.industry, Annealing (metallurgy), Transistor, General Engineering, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Nitrogen, law.invention, chemistry, X-ray photoelectron spectroscopy, law, Thin-film transistor, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business
الوصف: In this study, we show the evolution of nitrogen defects during a sol–gel reaction in flash-lamp-annealed InGaZnO (IGZO) films and their effects on the device characteristics of their thin-film transistors (TFTs). The flash lamp annealing (FLA) of the IGZO TFT for 16 s helps achieve a mobility of approximately 7 cm2 V−1 s−1. However, further extension of the annealing time results only in drastic increases in carrier concentration and off-current. The X-ray photoelectron spectroscopy (XPS) analysis of the N 1s peak unravels the presence of oxygen-vacancy-associated nitrogen defects and their evolution with annealing time, which is possibly responsible for the increase in carrier concentration.
تدمد: 1882-0786
1882-0778
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::adf9668b8d5dbf70f5259b2bf9ac3fddTest
https://doi.org/10.7567/apex.11.061104Test
حقوق: CLOSED
رقم الانضمام: edsair.doi...........adf9668b8d5dbf70f5259b2bf9ac3fdd
قاعدة البيانات: OpenAIRE