Plasma Source Ion Implantation research and applications at Los Alamos National Laboratory

التفاصيل البيبلوغرافية
العنوان: Plasma Source Ion Implantation research and applications at Los Alamos National Laboratory
المؤلفون: R. J. Faehl, D. J. Rej, Carter P. Munson, W. A. Reass, M. Tuszewski, J.T. Scheuer, Blake P. Wood, Michael Nastasi, I. Henins, Kevin C. Walter
المصدر: AIP Conference Proceedings.
بيانات النشر: AIP, 1997.
سنة النشر: 1997
مصطلحات موضوعية: Materials science, Ion implantation, chemistry, Silicon, Aluminium, Nuclear engineering, Metallurgy, chemistry.chemical_element, Deposition (phase transition), Plasma, Tungsten, Ion, Titanium
الوصف: Plasma Source Ion Implantation research at Los Alamos Laboratory includes direct investigation of the plasma and materials science involved in target surface modification, numerical simulations of the implantation process, and supporting hardware engineering. Target materials of Al, Cr, Cu-Zn, Mg, Ni, Si, Ti, W, and various Fe alloys have been processed using plasmas produced from Ar, NH3, N2, CH4, and C2H2 gases. Individual targets with surface areas as large as ∼4 m2, or weighing up to 1200 kg, have been treated in the large LANL facility. In collaboration with General Motors and the University of Wisconsin, a process has been developed for application of hard, low friction, diamond-like-carbon layers on assemblies of automotive pistons. Numerical simulations have been performed using a 2 1/2-D particle-in-cell code, which yields time-dependent implantation energy, dose, and angle of arrival for ions at the target surface for realistic geometries. Plasma source development activities include the investi...
تدمد: 0094-243X
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8cc197ef0a80e064b979828842ea773cTest
https://doi.org/10.1063/1.52620Test
حقوق: OPEN
رقم الانضمام: edsair.doi...........8cc197ef0a80e064b979828842ea773c
قاعدة البيانات: OpenAIRE