مؤتمر
Al redistribution into SiO/sub 2//Si system during oxidation of high dose Al-implanted silicon
| العنوان: | Al redistribution into SiO/sub 2//Si system during oxidation of high dose Al-implanted silicon |
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| المؤلفون: | Iacona, F., Raineri, V., La Via, F., Gasparotto, A., Cali, D., Rimini, E. |
| المصدر: | 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) |
| بيانات النشر: | IEEE |
| سنة النشر: | 2003 |
| نوع الوثيقة: | conference object |
| اللغة: | unknown |
| DOI: | 10.1109/iit.1999.812070 |
| الإتاحة: | https://doi.org/10.1109/iit.1999.812070Test http://xplorestaging.ieee.org/ielx5/6566/17540/00812070.pdf?arnumber=812070Test |
| رقم الانضمام: | edsbas.593731E4 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1109/iit.1999.812070 |
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