دورية أكاديمية
Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond
| العنوان: | Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond |
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| المؤلفون: | Chang-Min Park, Chawon Koh, Cheolhong Park, Hai-Sub Na, Han-Ku Cho, Hyun-Woo Kim, In-Sung Kim, Sumin Kim |
| المصدر: | Journal of Photopolymer Science and Technology. 2011, 24(2):119 |
| قاعدة البيانات: | J-STAGE |
| تدمد: | 09149244 13496336 |
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| DOI: | 10.2494/photopolymer.24.119 |