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1دورية أكاديمية
المؤلفون: Wang, Qiang, Vogt, Holger
مصطلحات موضوعية: plasma enhanced chemical vapor deposition (PECVD), polycrystalline silicon germanium (poly-SiGe), titanium, specific contact resistance, activation energy, interfacial layer, post-CMOS integration
الوقت: 621
العلاقة: Journal of Electronic Materials; https://publica.fraunhofer.de/handle/publica/258708Test
الإتاحة: https://doi.org/10.1007/s11664-019-07561-4Test
https://publica.fraunhofer.de/handle/publica/258708Test -
2مؤتمر
المؤلفون: Goetzberger, A., Räuber, A.
مصطلحات موضوعية: crystalline silicon, crystallization, Kristallines Silizium, Kristallisation, material for solar cells, Material für Solarzellen, polycrystalline silicon sheets, Polykristalline Siliziumschicht, Schichtherstellung, sheet preparation
الوقت: 621, 697
العلاقة: Photovoltaic Specialists Conference 1988; 20th IEEE Photovoltaic Specialists Conference '88. Vol.II; https://publica.fraunhofer.de/handle/publica/314861Test
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3
المؤلفون: Petzold, M., Bagdahn, J., Katzer, D.
مصطلحات موضوعية: single crystalline silicon, polycrystalline silicon, wafer bonding, strength, fatigue
الوقت: 531, 620
العلاقة: The world of electronic packaging and system integration; https://publica.fraunhofer.de/handle/publica/207087Test