دورية أكاديمية
Nanostructures using self-assembled multilayers as molecular rulers and etch resists
| العنوان: | Nanostructures using self-assembled multilayers as molecular rulers and etch resists |
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| المؤلفون: | Srinivasan, Charan, Hohman, J. Nathan, Anderson, Mary Elizabeth, Weiss, Paul S., Horn, Mark W. |
| المصدر: | Chemistry Department Faculty Citations |
| بيانات النشر: | Furman University Scholar Exchange |
| سنة النشر: | 2007 |
| المجموعة: | Furman University Scholar Exchange (FUSE) |
| مصطلحات موضوعية: | plasma processing, light sensitive materials, metal oxides, chemical processes, transition metals, 16-mercaptohexadecanoic acid, metal deposition, etching, supramolecular chemistry, surface collisions |
| الوصف: | Self-assembled multilayers, composed of alternating layers of α,ω-mercaptoalkanoic acids and Cu2+ ions (“molecular rulers”), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed. |
| نوع الوثيقة: | text |
| اللغة: | unknown |
| العلاقة: | https://scholarexchange.furman.edu/chm-citations/503Test; https://scholar.google.com/scholar?q=10.1116/1.2811712Test |
| DOI: | 10.1116/1.2811712 |
| الإتاحة: | https://scholarexchange.furman.edu/chm-citations/503Test https://scholar.google.com/scholar?q=10.1116/1.2811712Test |
| رقم الانضمام: | edsbas.230E6DD2 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1116/1.2811712 |
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