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1مؤتمر
المؤلفون: Cen, Yinjie, Aqad, Emad, Cui, Li, Coley, Suzanne M., Park, Jong Keun, Naab, Benjamin D., Rena, Rochelle, Paul, Tyler, Eckert, Sylvie, Wu, Chunyi, Finch, Michael, Behnke, Jason, Lee, ChoongBong, Petrillo, Karen E.
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XLI
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2مؤتمر
المؤلفون: Cen, Yinjie, Park, Jong Keun, Coley, Suzanne M., Naab, Benjamin D., Cui, Li, Aqad, Emad, Alexandrescu, Stefan, Rena, Rochelle, Eckert, Sylvie, Behnke, Jason, Lee, ChoongBong, Petrillo, Karen E.
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XLI
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3مؤتمر
المؤلفون: Rafael-Naab, Benjamin D., Park, Jong Keun, Aqad, Emad, Cen, Yinjie, Coley, Suzanne M., Cui, Li, Hoelzel, Conner, Lee, Choong Bong, Behnke, Jason, Rena, Rochelle, Eckert, Sylvie, Alexandrescu, Stefan, Sachinthani, Niradha, Finch, Michael, Petrillo, Karen E., Cheng, Li
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XLI
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4مؤتمر
المؤلفون: Coley, Suzanne, Park, Jong Keun, Aqad, Emad, Cen, Yinjie, Cui, Li, Hoelzel, Conner, Naab, Benjamin D., Melanson, Maria, Tran, Hung, Alexandrescu, Stefan, Rena, Rochelle, Behnke, Jason, Petrillo, Karen E.
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XLI
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5مؤتمر
المؤلفون: Hoelzel, Conner, Cui, Li, Naab, Benjamin D., Park, Jong Keun, Kang, Philjae, Hernandez, Kenneth, Coley, Suzanne M., Alexandrescu, Stefan, Rena, Rochelle, Cameron, James F., Aqad, Emad
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XL
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6مؤتمر
المؤلفون: Park, Jong Keun, Aqad, Emad, Cen, Yinjie, Coley, Suzanne, Cui, Li, Hoelzel, Conner, Naab, Benjamin, Lee, Choong Bong, Rena, Rochelle, Kang, Philjae, Shin, You Rim, Limberg, David, Zhang, Lei
المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar
المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII
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7مؤتمر
المؤلفون: Cen, Yinjie, Lee, ChoongBong, Cui, Li, Coley, Suzanne M., Park, Jong Keun, Naab-Rafael, Benjamin D., Aqad, Emad, Rena, Rochelle, Paul, Tyler, Penniman, Thomas, Behnke, Jason, Early, Julia T., Foltz, Benjamin
المساهمون: Guerrero, Douglas, Amblard, Gilles R.
المصدر: Advances in Patterning Materials and Processes XL
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8مؤتمر
المؤلفون: Cutler, Charlotte A., Millward, Dan, Lee, Choong-Bong, Thackeray, James W., Nelson, John, DeSisto, Jason, Rena, Rochelle, Mack, Chris
المساهمون: Gronheid, Roel, Sanders, Daniel P.
المصدر: Advances in Patterning Materials and Processes XXXVII
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9مؤتمر
المؤلفون: Cutler, Charlotte A., Lee, Choong Bong, Thackeray, James W., Nelson, John, DeSisto, Jason, Rena, Rochelle, Trefonas, Peter, Mack, Chris A.
المساهمون: Gronheid, Roel, Sanders, Daniel P.
المصدر: Advances in Patterning Materials and Processes XXXVI
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10مؤتمر
المؤلفون: Cutler, Charlotte, Thackeray, James W., DeSisto, Jason, Lee, Choong-Bong, Li, Mingqi, Aqad, Emad, Hou, Xisen, Marangoni, Tomas, Kaitz, Joshua, Rena, Rochelle, Mack, Chris, Nelson, John
المساهمون: Kye, Jongwook, Owa, Soichi
المصدر: Optical Microlithography XXXI